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Major capability parameter | |||
Growth method | Czochralski method | ||
Crystal structure | M3 | ||
Unit cell constant | a=b=5.148Å c=13.863 Å | ||
Melt point(℃) | 1250 | ||
Density(g/cm3) | 4.64 | ||
Hardness | 5(mohs) | ||
Through scope | 0.4-2.9um | ||
Index of refraction | no=2.286 ne=2.203 (632.8nm) | ||
Nonlinear coefficient | d33=34.45,d31=d15=5.95,d22=13.07 (pmv-1) | ||
Denko coefficient | γ13=8.6,γ22=3.4,γ33=30.8,γ51=28.0,γ22=6.00(pmv-1) | ||
Through scope | 370~5000nm >68% (632.8nm) | ||
Thermal expansion | a11=15.4×10-6/k,a33=7.5×10-6/k | ||
Product specification | |||
Size | <Ø3″ | Surface quality | 10/5 |
Size tolerances |
Z: ±0.3mm X,Y:±0.1mm |
Plane degrees |
v8 (632.8nm)
|
Rotating angles | 0.5mm max, 45 º±5 º | coating film | R<0.2%(1064nm) |
Precision |
Z: 5′ X,Y:<10′ |
distorted |
<N4(633nm)
|
Pack | 100 clean bag,1000 exactly clean bag |